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Non-contact measurement of semiconductor wafer shape(warpage) after cutting and polishing

Non-contact measurement of semiconductor wafer shape(warpage) after cutting and polishing
Non-contact measurement of semiconductor wafer shape(warpage) after cutting and polishing

After cutting (dicing) and polishing wafers, we want to control the numerical value of warpage.Is there a simple, non-contact method?

Angle measurement of semiconductor wafers after cutting and polishing with a tilt sensor. Numerical control of shape (warpage) is possible without contact. Yield and quality checks become easier.

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