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Optical axis adjustment of semiconductor wafer projection (exposure) lens block

Optical axis adjustment of semiconductor wafer projection (exposure) lens block
Optical axis adjustment of semiconductor wafer projection (exposure) lens block
Optical axis adjustment of semiconductor wafer projection (exposure) lens block

Is there a way to build projection lens blocks for wafer exposure systems without variation? 

Tilt sensor enables non-contact measurement of the optical axis of the projection lens block, photomask, and lens tilt.This leads to reduced takt time and improved variability.

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